Ars Electronica Futurelab Academy
Students from Hong Kong Are Attending a Multi-day Workshop at the Futurelab
(Linz, January 13, 2015) A group of Hong Kong Design Institute students will be in Linz over the next 10 days in conjunction with the Ars Electronica Futurelab Academy. Between Thursday, January 14th and Friday, January 23rd, they’ll be attending a multi-day workshop conceived by Ars Electronica Futurelab staffers. The workshop participants are undergrads majoring in architectural design, landscape architecture, film & TV, visual communication, creative media and exhibition design. They’ll partake of inspiring talks, creative sessions and mentoring in small groups to help them develop ideas and implementation strategies for their final projects at the conclusion of their two-year program of study. The workshop curriculum will be supplemented by visits to museums and cultural facilities in Linz and Vienna. Serving as these young people’s mentors will be Futurelab staffers Hideaki Ogawa, Claudia Schnugg, Peter Freudling, Kristefan Minski and Stefan Mittlböck. “The Academy is one of several educational programs we offer to students and artists worldwide,” stated Ars Electronica Futurelab Director Horst Hörtner. “More and more universities are taking advantage of the opportunity to send their students to us so these youngsters can engage in a process of exchange with members of the Futurelab’s staff, get feedback about their projects, and collaboratively develop them further. Now, a month rarely goes by when we don’t have a group of students or several artists-in-residence joining us here at the Futurelab.”
The Futurelab Academy
The Ars Electronica Futurelab Academy encompasses a series of activities that facilitate conveying and exchanging knowledge. The program is based on expertise provided by members of the Futurelab staff as well as the facility’s wide-ranging network of associated artists and institutions. It is offered to organizations, educational institutions and private firms active in fields at the interface of art, design and technology.
Ars Electronica Center / Lois Lammerhuber, Nicolas Ferrando / Printversion